A Free Boundary Problem for Some Modified Predator-Prey Model in a Higher Dimensional Environment

Applications of Mathematics - We focus on the free boundary problems for a Leslie-Gower predator-prey model with radial symmetry in a higher dimensional environment that is initially well populated...     

金属衬底在石墨烯化学气相沉积生长中的作用

以过渡金属为催化衬底的化学气相沉积法(Chemical Vapor Deposition，CVD)已经可以制备与机械剥离样品相媲美的石墨烯，是实现石墨烯工业应用的关键技术之一。原子尺度理论研究能够帮助我们深刻理解石墨烯生长机理，为实验现象提供合理的解释，并有可能成为将来实验设计的理论指导。本文从理论计算的角度，总结了各种金属衬底在石墨烯CVD生长过程中的各种作用与相应的机理，包括在催化碳源裂解、降低石墨烯成核密度等，催化加快石墨烯快速生长，修复石墨烯生长过程中产生的缺陷，控制外延生长石墨烯的晶格取向，以及在降温过程中石墨烯褶皱与金属表面台阶束的形成过程等。在本文最后，我们对当前石墨烯生长领域中亟需解决的理论问题进行了深入探讨与展望。     

雾化辅助化学气相沉积法氧化镓薄膜生长研究

采用自主设计搭建的雾化辅助化学气相沉积系统设备,开展了Ga₂O₃薄膜制备及其特性研究工作。通过X射线衍射研究了沉积温度、系统沉积压差对Ga₂O₃薄膜结晶质量的影响。结果表明,Ga₂O₃在425~650 ℃温度区间存在物相转换关系。随着沉积温度从425 ℃升高至650 ℃,薄膜结晶分别由非晶态、纯α-Ga₂O₃结晶状态向α-Ga₂O₃、β-Ga₂O₃两相混合结晶状态改变。通过原子力显微镜表征探究了生长温度对Ga₂O₃薄膜表面形貌的影响,从475 ℃升高至650 ℃时,薄膜表面粗糙度由26.8 nm下降至24.8 nm。同时,高分辨X射线衍射仪测试表明475 ℃、5 Pa压差条件下的α-Ga₂O₃薄膜样品半峰全宽仅为190.8″,为高度结晶态的单晶α-Ga₂O₃薄膜材料。     

Examples of compactλ-hypersurfaces in Euclidean spaces

In this paper,we first construct compact embeddedλ-hypersurfaces with the topology of torus which are calledλ-torus in Euclidean spaces?n^+1.Then,we give many compact immersedλ-hypersurfaces in Euclidean spaces?n^+1.     

On the $$\bar\partial$$ -problem and dressing method for the complex vector modified KdV equation

Theoretical and Mathematical Physics - Starting from a $$5\times 5$$ local matrix $$\bar\partial$$ -problem, we successfully use the $$\bar\partial$$ -dressing method to derive a hierarchy of...     

直接碳燃料电池燃料的研究进展

直接碳燃料电池(DCFC)是一种清洁高效利用碳资源发电的装置。其因能量转换率高,对环境污染小,燃料选择范围广等优点获得了越来越多的关注。DCFC的性能与使用的燃料密切相关,为了探究燃料对DCFC的影响,本文分别阐述了石墨、炭黑、中密度纤维板、生物质、煤、活性炭的特性及改性方法,分析讨论了燃料表面含氧官能团以及燃料中的金属催化剂对阳极电化学反应的促进作用,发现燃料表面化学性质要比比表面积更加重要。同时,本文也提出了对生物质这一优良的可再生资源的期待,为未来DCFC燃料的发展提供参考。     

On Minimal Asymptotic Bases

Mathematical Notes - Let $$\mathbb N$$ denote the set of all nonnegative integers, and let $$A\subseteq\mathbb N$$ . Let $$h,n\in\mathbb N$$ , $$h\ge 2$$ and $$r_h(A,n)=\#\{(a_1,\dots,a_h)\in...     

Analysis on First-stage Ignition of n-Heptane at Low Temperatures with a Lumped Skeletal Mechanism

Two-stage ignition exists in the low-temperature combustion process of n-heptane and the first-stage ignition also shows a negative temperature coefficient(NTC) phenomenon. To study key reactions and understand chemical principles affecting the first-stage ignition of n-heptane, a lumped skeletal mechanism with 62 species is obtained based on the detailed NUIGMech1.0 mechanism using the directed relation graph method assisted by sensitivity analysis and isomer lumping. The lumped mechanism shows good performance on ignition delay time under wide conditions. The study revealed that the temperature after the first-stage ignition is higher and a larger amount of fuel is consumed at lower initial temperatures. The temperature at the first-stage ignition is relatively insensitive to the initial temperature. Further sensitivity analysis and reaction path analysis carried out based on the lumped mechanism show that the decomposition of RO₂ to produce alkene and HO₂is the most important reaction to inhibit the first-stage ignitions. The chain branching explosion closely related to the first-stage ignition will be terminated when the rate constant for the RO₂ decomposition is larger than that of the isomerization of RO₂ to produce QOOH. The NTC behavior as well as other characteristics of the first-stage ignition can be rationalized from the competition between these two reactions.     

LWE from non-commutative group rings

Designs, Codes and Cryptography - The Learning-With-Errors (LWE) problem (and its variants including Ring-LWE and Module-LWE), whose security are based on hard ideal lattice problems, has proven to...     

基于摩擦磨损的KDP晶体固结磨料抛光垫优化

本文通过固结磨料球与KDP晶体对磨的单因素试验探究固结磨料球中反应物种类、磨粒浓度、反应物浓度、基体硬度对摩擦系数、磨痕截面积和磨痕处粗糙度的影响,试验结果表明:KHCO₃固结磨料球对磨后磨痕对称性好,磨痕处的粗糙度值低;磨痕截面积随磨粒和反应物浓度的增加而增大,随基体硬度的增大而降低;磨痕处粗糙度随磨粒和反应物浓度的增加先降低后上升,随基体硬度的增大先上升后降低;摩擦系数受磨粒和反应物浓度影响不明显,随基体硬度的增大而降低。选择KHCO₃作为反应物,Ⅰ基体,磨粒浓度为基体质量的100%,反应物浓度为15%制备固结磨料球与KDP晶体对磨后的磨痕轮廓对称度好且磨痕处粗糙度值低,以该组分制备固结磨料垫干式抛光KDP晶体,可实现晶体表面粗糙度Sa值为18.50 nm,材料去除率为130 nm/min的高效精密加工。